Recent Progress in Plasmonic Colour Filters for Image Sensor and Multispectral Applications

摘要

Using nanostructured thin metal films as colour filters offers several important advantages, in particular high tunability across the entire visible spectrum and some of the infrared region, and also compatibility with conventional CMOS processes. Since 2003, the field of plasmonic colour filters has evolved rapidly and several different designs and materials, or combination of materials, have been proposed and studied. In this paper we present a simulation study for a single- step lithographically patterned multilayer structure able to provide competitive transmission efficiencies above 40% and contemporary FWHM of the order of 30 nm across the visible spectrum. The total thickness of the proposed filters is less than 200 nm and is constant for every wavelength, unlike e.g. resonant cavity-based filters such as Fabry-Perot that require a variable stack of several layers according to the working frequency, and their passband characteristics are entirely controlled by changing the lithographic pattern. It will also be shown that a key to obtaining narrow-band optical response lies in the dielectric environment of a nanostructure and that it is not necessary to have a symmetric structure to ensure good coupling between the SPPs at the top and bottom interfaces. Moreover, an analytical method to evaluate the periodicity, given a specific structure and a desirable working wavelength, will be proposed and its accuracy demonstrated. This method conveniently eliminate the need to optimize the design of a filter numerically, i.e. by running several time-consuming simulations with different periodicities. © (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.